While there exist many hard-and-fast principles to manipulate at the atomic-scale the electronic, redox, and optical characteristics of Ï-conjugated molecules and polymers, the translation of these molecular characteristics to the macroscopic materials properties that are critical to the functionality of organic semiconductors remains highly Edisonian. Recent experimental and theoretical efforts have brought forward some under underpinnings to direct molecular-scale and microscopic order in organic semiconductors through molecular and process design, though these concepts are not robust and often fall short across materials classes. This workshop will bring together synthetic chemists, materials scientists and engineers, process design specialists, device engineers, and theoreticians to chart the next steps forward in the design of new generations of organic semiconductors with a view towards controlling assembly.
We wish to ensure an intimate workshop setting, with no more than 20 to 25 participants. If you are interested in attending, but have not received an invitation, please contact the workshop organizer before registering. If you have registered for a meeting you were not invited to, you may be subject to a $100 fee.
TSRC is about expanding the frontiers of science, exploring new ideas, and building collaborations. The workshop schedule will allow for substantial unstructured time for participants to talk and think. All participants are expected to stay for the entire duration of the workshop. Scientists are encouraged to consider bringing family or friends. Telluride offers a number of options for children's camps (including Telluride Academy, Aha School for the Arts, and Pinhead Institute). There is more information on childcare, camps, and family activities on TSRC's website. Feel free to contact TSRC's staff to help with any planning and/or coordinating care.
Telluride Intermediate School
725 West Colorado Ave
Telluride, CO 81435
Participant | Organization | ||||
Ade, Harald | North Carolina State University | ||||
Amassian, Aram | North Carolina State University | ||||
Anthony, John | University of Kentucky | ||||
Asadi, Kamal | Max-Planck Institute for Polymer Research | ||||
Banerji, Natalie | University of Bern | ||||
Brettmann, Blair | Georgia Tech | ||||
bronstein, hugo | Cambridge University | ||||
DeLongchamp, Dean | National Institute of Standards and Technology | ||||
Diao, Ying | University of Illinois at Urbana-Champaign | ||||
DiTullio, Brandon Tyler | Georgia Institute of Technology | ||||
Durbin, Marlow | Georgia Institute of Technology | ||||
Frey, Gitti | Technion | ||||
Ganapathysubramanian, Baskar | Iowa State University | ||||
Gomez, Enrique | The Pennsylvania State University | ||||
Hofmann, Oliver | Graz University of Technology | ||||
Inal, Sahika | King Abdullah University of Science and Technology (KAUST) | ||||
Khirbat, Aditi | Georgia Institute of Technology | ||||
Loo, Yueh-Lin | Princeton University | ||||
Martín, Jaime | POLYMAT - University of the Basque Country | ||||
Mei, Jianguo | Purdue University | ||||
Michels, Jasper | Max Planck Institute for Polymer Research | ||||
Nicolini, Tommaso | University of Bordeaux | ||||
Richter, Lee | NIST | ||||
Risko, Chad | University of Kentucky | ||||
Stingelin, Natalie | Georgia Tech | ||||